共 11 条
- [1] Chu W. K., 1978, AIP Conference Proceedings, P305
- [2] KOIKE A, 1982, EL SOC EXT ABSTR, V82, P343
- [3] ANISOTROPIC-PLASMA ETCHING OF POLYSILICON [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (03): : 721 - 730
- [4] POGGE HB, 1978, J ELECTROCHEM SOC, V125, pC470
- [5] REACTIVE ION ETCHING OF ALUMINUM AND ALUMINUM-ALLOYS IN AN RF PLASMA CONTAINING HALOGEN SPECIES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 334 - 337
- [6] REACTIVE ION ETCHING OF SILICON [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 410 - 413
- [7] SCHWARTZ GC, 1981, PLASMA PROCESSING, P133
- [8] SCHWARTZ GC, 1979, EL SOC EXT ABSTR, V79, P1535