KINETICS OF COSI2 FROM EVAPORATED SILICON

被引：80

作者：

LIEN, CD ^{[1
]}

NICOLET, MA ^{[1
]}

LAU, SS ^{[1
]}

机构：

[1] UNIV CALIF SAN DIEGO,LA JOLLA,CA 92093

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1984年 / 34卷 / 04期

关键词：

D O I：

10.1007/BF00616581

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：249 / 251

页数：3

相关论文

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