KINETICS OF TISI2 FORMATION BY THIN TI FILMS ON SI

被引：149

作者：

HUNG, LS

GYULAI, J

MAYER, JW

LAU, SS

NICOLET, MA

机构：

[1] UNIV CALIF SAN DIEGO,LA JOLLA,CA 92093

[2] CALTECH,PASADENA,CA 91125

来源：

JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 09期

关键词：

D O I：

10.1063/1.332781

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：5076 / 5080

页数：5

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