DIFFUSION-CONTROLLED BIMOLECULAR RECOMBINATION OF ELECTRONS AND HOLES IN A-SI-H

被引:30
作者
SCHIFF, EA
机构
[1] Department of Physics, Syracuse University, Syracuse
关键词
D O I
10.1016/0022-3093(95)00251-0
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The fluctuation-dominated and mean-field models for diffusion-controlled bimolecular recombination are compared with picosecond domain transient optical experiments on a-Si:H. Using no fitting parameters, the fluctuation-dominate model gives a good account for the optical decay times as a function of laser intensity. A lower bound for the thermalization radius of a photogenerated electron-hole pair, r(0) > 12 nm, is inferred. a-Si:H is a felicitous material for exhibiting the fluctuation-dominate effects since it combines a modest electron mobility with an unexplained but large thermalization radius. However, the role of the electrostatic potential fluctuations due to the charged electrons and holes is not understood.
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页码:1 / 8
页数:8
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