共 6 条
[1]
IMPACT OF DIFFERENT X-RAY MASK SUBSTRATE MATERIALS ON OPTICAL ALIGNMENT
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1992, 10 (06)
:3204-3207
[2]
IMPROVEMENT OF HETERODYNE ALIGNMENT TECHNIQUE FOR X-RAY STEPPERS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1993, 11 (06)
:2179-2182
[3]
FABRICATION OF FULLY SCALED 0.5-MU-M N-TYPE METAL-OXIDE SEMICONDUCTOR TEST DEVICES USING SYNCHROTRON X-RAY-LITHOGRAPHY - OVERLAY, RESIST PROCESSES, AND DEVICE FABRICATION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1988, 6 (06)
:2147-2152
[4]
AN OPTICAL-HETERODYNE ALIGNMENT TECHNIQUE FOR QUARTER-MICRON X-RAY-LITHOGRAPHY
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1989, 7 (06)
:1971-1976
[5]
X-RAY STEPPER AIMING AT 0.2-MU-M SYNCHROTRON ORBITAL RADIATION LITHOGRAPHY
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1993, 11 (06)
:2997-3002
[6]
A MASK-TO-WAFER ALIGNMENT AND GAP SETTING METHOD FOR X-RAY-LITHOGRAPHY USING GRATINGS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1991, 9 (06)
:3202-3206