AN OPTICAL-HETERODYNE ALIGNMENT TECHNIQUE FOR QUARTER-MICRON X-RAY-LITHOGRAPHY

被引：31

作者：

SUZUKI, M

UNE, A

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584659

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1971 / 1976

页数：6

共 10 条

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[8] REPLICATED RESIST PATTERN RESOLUTION WITH SYNCHROTRON ORBITAL RADIATION [J].

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[9] STABILIZED TRANSVERSE ZEEMAN LASER AS A NEW LIGHT-SOURCE FOR OPTICAL MEASUREMENT [J].

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