REPLICATED RESIST PATTERN RESOLUTION WITH SYNCHROTRON ORBITAL RADIATION

被引：11

作者：

SUZUKI, M

KANEKO, T

SAITOH, Y

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 01期

关键词：

D O I：

10.1116/1.584694

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：47 / 54

页数：8

共 11 条

[1] X-RAY LITHOGRAPHY BY SYNCHROTRON RADIATION OF INS-ES [J].

ARITOME, H ;

NISHIMURA, T ;

KOTANI, H ;

MATSUI, S ;

NAKAGAWA, O ;

NAMBA, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :992-994

[2]

ARITOME H, 1907, J VAC SCI TECHNOL, V16, P1939

[3] DIFFRACTION EFFECTS ON PATTERN REPLICATION WITH SYNCHROTRON RADIATION [J].

ATODA, N ;

KAWAKATSU, H ;

TANINO, H ;

ICHIMURA, S ;

HIRATA, M ;

HOH, K .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1267-1270

[4] CALCULATION OF THE OPTIMUM ELECTRON-ENERGY OF A DEDICATED STORAGE RING FOR X-RAY-LITHOGRAPHY [J].

BETZ, H ;

FEY, FK ;

HEUBERGER, A ;

TISCHER, P .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) :693-698

[5] X-RAY REPLICATION OF MASKS USING SYNCHROTRON RADIATION PRODUCED BY ACO STORAGE RING [J].

FAY, B ;

TROTEL, J ;

PETROFF, Y ;

PINCHAUX, R ;

THIRY, P .

APPLIED PHYSICS LETTERS, 1976, 29 (06) :370-372

[6] COMPUTER-SIMULATIONS OF RESIST PROFILES IN X-RAY-LITHOGRAPHY [J].

HEINRICH, K ;

BETZ, H ;

HEUBERGER, A ;

PONGRATZ, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1254-1258

[7]

KANEKO T, 1984, 17TH C SSDM TOK, P353

[8]

SEIKIMOTO M, 1984, 16TH C SSDM KOB, P23

[9]

SILVERMAN JP, 1984, SPIE, V393, P99

[10] APPLICATION OF SYNCHROTRON RADIATION TO X-RAY LITHOGRAPHY [J].

SPILLER, E ;

EASTMAN, DE ;

FEDER, R ;

GROBMAN, WD ;

GUDAT, W ;

TOPALIAN, J .

JOURNAL OF APPLIED PHYSICS, 1976, 47 (12) :5450-5459

← 1 2 →