SELECTIVE DEPOSITION OF SILICON-OXIDE AND ITS APPLICATION

被引：4

作者：

AWAYA, N

ARITA, Y

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1986年 / 25卷 / 01期

关键词：

D O I：

10.1143/JJAP.25.L24

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L24 / L26

页数：3

共 10 条

[1]

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[2]

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[3]

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[4]

MILLER NE, 1982, SOLID STATE TECHNOL, V25, P85

PLISKIN, WA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (05) :1064-1081

[6] SELECTIVE DEPOSITION OF SIO2 THIN-FILMS IN ACID BATHS [J].

SMITH, MA ;

LEVENSON, LL .

[7]

TANNO K, 1982, JPN J APPL PHYS, V21, P564

TAYLOR, GN ;

STILLWAGON, LE ;

VENKATESAN, T .

[9]

WATANABE N, 1973, HYOMEN OYOBI KAIMEN, P151

[10]

YAMADA M, 1982, 4TH P S DRY PROC TOK, P90