TEMPERATURE EVOLUTIONS IN SILICON INDUCED BY A SCANNED CW LASER, PULSED LASER, OR AN ELECTRON-BEAM

被引：21

作者：

FERRIEU, F

AUVERT, G

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 05期

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D O I：

10.1063/1.332339

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：2646 / 2649

页数：4

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