NANOMETER-SCALE LITHOGRAPHY ON SI SURFACE BY DECOMPOSITION OF FERROCENE MOLECULES USING A SCANNING TUNNELING MICROSCOPE

被引：29

作者：

THIBAUDAU, F

ROCHE, JR

SALVAN, F

机构：

[1] Groupe de Physique des Etats Condensés (URA CNRS 783), Faculté des Sciences de Luminy, 13288 Marseille Cedex 09

来源：

APPLIED PHYSICS LETTERS | 1994年 / 64卷 / 04期

关键词：

D O I：

10.1063/1.111093

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We describe lithography experiments on boron doped Si substrates using the decomposition of ferrocene molecules with a scanning tunneling microscope tip. On the basis of writing conditions we propose that field ionization of the molecules is the key to the writing process and is responsible for the nanometer definition of the pattern edge.

引用

页码：523 / 525

页数：3

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