PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITED SIO2/INP INTERFACE

被引：51

作者：

WAGER, JF

WILMSEN, CW

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 08期

关键词：

D O I：

10.1063/1.331416

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5789 / 5797

页数：9

共 39 条

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