INFRARED STUDIES OF REACTIVELY SPUTTERED SIOX FILMS IN THE COMPOSITION RANGE 0.2-LESS-THAN-OR-EQUAL-TO-X-LESS-THAN-OR-EQUAL-TO-1.9

被引：66

作者：

SCHUMANN, L ^{[1
]}

LEHMANN, A ^{[1
]}

SOBOTTA, H ^{[1
]}

RIEDE, V ^{[1
]}

TESCHNER, U ^{[1
]}

HUBNER, K ^{[1
]}

机构：

[1] KARL MARX UNIV,SEKT PHYS,ARBEITSGEMEINSCHAFT A3B5,DDR-7010 LEIPZIG,GER DEM REP

来源：

PHYSICA STATUS SOLIDI B-BASIC RESEARCH | 1982年 / 110卷 / 01期

关键词：

D O I：

10.1002/pssb.2221100157

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：K69 / K73

页数：5

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