学术探索
学术期刊
新闻热点
数据分析
智能评审
立即登录
INTERFACE TRAPS GENERATED BY INTERNAL PHOTOEMISSION IN AL-SIO2-SI STRUCTURES
被引:23
作者
:
ZEKERIYA, V
论文数:
0
引用数:
0
h-index:
0
ZEKERIYA, V
MA, TP
论文数:
0
引用数:
0
h-index:
0
MA, TP
机构
:
来源
:
APPLIED PHYSICS LETTERS
|
1983年
/ 43卷
/ 01期
关键词
:
D O I
:
10.1063/1.94135
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:95 / 97
页数:3
相关论文
共 22 条
[1]
GATE-WIDTH DEPENDENCE OF RADIATION-INDUCED INTERFACE TRAPS IN METAL-SIO2/SI DEVICES
[J].
CHIN, MR
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
CHIN, MR
;
MA, TP
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
MA, TP
.
APPLIED PHYSICS LETTERS,
1983,
42
(10)
:883
-885
[2]
CHARACTERISTICS OF SURFACE-STATE CHARGE (QSS) OF THERMALLY OXIDIZED SILICON
[J].
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
;
SKLAR, M
论文数:
0
引用数:
0
h-index:
0
SKLAR, M
;
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
;
SNOW, EH
论文数:
0
引用数:
0
h-index:
0
SNOW, EH
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1967,
114
(03)
:266
-+
[3]
THE EFFECTS OF WATER ON OXIDE AND INTERFACE TRAPPED CHARGE GENERATION IN THERMAL SIO2-FILMS
[J].
FEIGL, FJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
FEIGL, FJ
;
YOUNG, DR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
YOUNG, DR
;
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
DIMARIA, DJ
;
LAI, S
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
LAI, S
;
CALISE, J
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
CALISE, J
.
JOURNAL OF APPLIED PHYSICS,
1981,
52
(09)
:5665
-5682
[4]
FORMATION OF SURFACE STATES DURING STRESS AGING OF THERMAL SI-SIO2 INTERFACES
[J].
GOETZBER.A
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
GOETZBER.A
;
LOPEZ, AD
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
LOPEZ, AD
;
STRAIN, RJ
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
STRAIN, RJ
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1973,
120
(01)
:90
-96
[5]
GRANTHANER FJ, 1980, IEEE T NUCL SCI, V27, P1640
[6]
RADIATION-INDUCED PERTURBATIONS OF ELECTRICAL PROPERTIES OF SILICON-SILICON DIOXIDE INTERFACE
[J].
HUGHES, HL
论文数:
0
引用数:
0
h-index:
0
机构:
Naval Research Laboratory, Washington
HUGHES, HL
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1969,
NS16
(06)
:195
-&
[7]
RADIATION-INDUCED SURFACE STATES IN MOS DEVICES
[J].
KJAR, RA
论文数:
0
引用数:
0
h-index:
0
机构:
ROCKWELL INT CORP,ELECTR RES DIV,3370 MIRALOMA AVE,ANAHEIM,CA 92803
ROCKWELL INT CORP,ELECTR RES DIV,3370 MIRALOMA AVE,ANAHEIM,CA 92803
KJAR, RA
;
NICHOLS, DK
论文数:
0
引用数:
0
h-index:
0
机构:
ROCKWELL INT CORP,ELECTR RES DIV,3370 MIRALOMA AVE,ANAHEIM,CA 92803
ROCKWELL INT CORP,ELECTR RES DIV,3370 MIRALOMA AVE,ANAHEIM,CA 92803
NICHOLS, DK
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1975,
22
(06)
:2193
-2196
[8]
2-CARRIER NATURE OF INTERFACE-STATE GENERATION IN HOLE TRAPPING AND RADIATION-DAMAGE
[J].
LAI, SK
论文数:
0
引用数:
0
h-index:
0
LAI, SK
.
APPLIED PHYSICS LETTERS,
1981,
39
(01)
:58
-60
[9]
EFFECTS OF AVALANCHE INJECTION OF ELECTRONS INTO SILICON DIOXIDE - GENERATION OF FAST AND SLOW INTERFACE STATES
[J].
LAI, SK
论文数:
0
引用数:
0
h-index:
0
LAI, SK
;
YOUNG, DR
论文数:
0
引用数:
0
h-index:
0
YOUNG, DR
.
JOURNAL OF APPLIED PHYSICS,
1981,
52
(10)
:6231
-6240
[10]
COMPARISON OF INTERFACE-STATE GENERATION BY 25-KEV ELECTRON-BEAM IRRADIATION IN P-TYPE AND N-TYPE MOS CAPACITORS
[J].
MA, TP
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
MA, TP
;
SCOGGAN, G
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
SCOGGAN, G
;
LEONE, R
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
LEONE, R
.
APPLIED PHYSICS LETTERS,
1975,
27
(02)
:61
-63
←
1
2
3
→
共 22 条
[1]
GATE-WIDTH DEPENDENCE OF RADIATION-INDUCED INTERFACE TRAPS IN METAL-SIO2/SI DEVICES
[J].
CHIN, MR
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
CHIN, MR
;
MA, TP
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
MA, TP
.
APPLIED PHYSICS LETTERS,
1983,
42
(10)
:883
-885
[2]
CHARACTERISTICS OF SURFACE-STATE CHARGE (QSS) OF THERMALLY OXIDIZED SILICON
[J].
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
;
SKLAR, M
论文数:
0
引用数:
0
h-index:
0
SKLAR, M
;
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
;
SNOW, EH
论文数:
0
引用数:
0
h-index:
0
SNOW, EH
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1967,
114
(03)
:266
-+
[3]
THE EFFECTS OF WATER ON OXIDE AND INTERFACE TRAPPED CHARGE GENERATION IN THERMAL SIO2-FILMS
[J].
FEIGL, FJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
FEIGL, FJ
;
YOUNG, DR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
YOUNG, DR
;
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
DIMARIA, DJ
;
LAI, S
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
LAI, S
;
CALISE, J
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
CALISE, J
.
JOURNAL OF APPLIED PHYSICS,
1981,
52
(09)
:5665
-5682
[4]
FORMATION OF SURFACE STATES DURING STRESS AGING OF THERMAL SI-SIO2 INTERFACES
[J].
GOETZBER.A
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
GOETZBER.A
;
LOPEZ, AD
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
LOPEZ, AD
;
STRAIN, RJ
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
STRAIN, RJ
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1973,
120
(01)
:90
-96
[5]
GRANTHANER FJ, 1980, IEEE T NUCL SCI, V27, P1640
[6]
RADIATION-INDUCED PERTURBATIONS OF ELECTRICAL PROPERTIES OF SILICON-SILICON DIOXIDE INTERFACE
[J].
HUGHES, HL
论文数:
0
引用数:
0
h-index:
0
机构:
Naval Research Laboratory, Washington
HUGHES, HL
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1969,
NS16
(06)
:195
-&
[7]
RADIATION-INDUCED SURFACE STATES IN MOS DEVICES
[J].
KJAR, RA
论文数:
0
引用数:
0
h-index:
0
机构:
ROCKWELL INT CORP,ELECTR RES DIV,3370 MIRALOMA AVE,ANAHEIM,CA 92803
ROCKWELL INT CORP,ELECTR RES DIV,3370 MIRALOMA AVE,ANAHEIM,CA 92803
KJAR, RA
;
NICHOLS, DK
论文数:
0
引用数:
0
h-index:
0
机构:
ROCKWELL INT CORP,ELECTR RES DIV,3370 MIRALOMA AVE,ANAHEIM,CA 92803
ROCKWELL INT CORP,ELECTR RES DIV,3370 MIRALOMA AVE,ANAHEIM,CA 92803
NICHOLS, DK
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1975,
22
(06)
:2193
-2196
[8]
2-CARRIER NATURE OF INTERFACE-STATE GENERATION IN HOLE TRAPPING AND RADIATION-DAMAGE
[J].
LAI, SK
论文数:
0
引用数:
0
h-index:
0
LAI, SK
.
APPLIED PHYSICS LETTERS,
1981,
39
(01)
:58
-60
[9]
EFFECTS OF AVALANCHE INJECTION OF ELECTRONS INTO SILICON DIOXIDE - GENERATION OF FAST AND SLOW INTERFACE STATES
[J].
LAI, SK
论文数:
0
引用数:
0
h-index:
0
LAI, SK
;
YOUNG, DR
论文数:
0
引用数:
0
h-index:
0
YOUNG, DR
.
JOURNAL OF APPLIED PHYSICS,
1981,
52
(10)
:6231
-6240
[10]
COMPARISON OF INTERFACE-STATE GENERATION BY 25-KEV ELECTRON-BEAM IRRADIATION IN P-TYPE AND N-TYPE MOS CAPACITORS
[J].
MA, TP
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
MA, TP
;
SCOGGAN, G
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
SCOGGAN, G
;
LEONE, R
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
LEONE, R
.
APPLIED PHYSICS LETTERS,
1975,
27
(02)
:61
-63
←
1
2
3
→