INTERFACE TRAPS GENERATED BY INTERNAL PHOTOEMISSION IN AL-SIO2-SI STRUCTURES

被引:23
作者
ZEKERIYA, V
MA, TP
机构
关键词
D O I
10.1063/1.94135
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:95 / 97
页数:3
相关论文
共 22 条
[1]   GATE-WIDTH DEPENDENCE OF RADIATION-INDUCED INTERFACE TRAPS IN METAL-SIO2/SI DEVICES [J].
CHIN, MR ;
MA, TP .
APPLIED PHYSICS LETTERS, 1983, 42 (10) :883-885
[2]   CHARACTERISTICS OF SURFACE-STATE CHARGE (QSS) OF THERMALLY OXIDIZED SILICON [J].
DEAL, BE ;
SKLAR, M ;
GROVE, AS ;
SNOW, EH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (03) :266-+
[3]   THE EFFECTS OF WATER ON OXIDE AND INTERFACE TRAPPED CHARGE GENERATION IN THERMAL SIO2-FILMS [J].
FEIGL, FJ ;
YOUNG, DR ;
DIMARIA, DJ ;
LAI, S ;
CALISE, J .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (09) :5665-5682
[4]   FORMATION OF SURFACE STATES DURING STRESS AGING OF THERMAL SI-SIO2 INTERFACES [J].
GOETZBER.A ;
LOPEZ, AD ;
STRAIN, RJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (01) :90-96
[5]  
GRANTHANER FJ, 1980, IEEE T NUCL SCI, V27, P1640
[6]   RADIATION-INDUCED PERTURBATIONS OF ELECTRICAL PROPERTIES OF SILICON-SILICON DIOXIDE INTERFACE [J].
HUGHES, HL .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1969, NS16 (06) :195-&
[7]   RADIATION-INDUCED SURFACE STATES IN MOS DEVICES [J].
KJAR, RA ;
NICHOLS, DK .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1975, 22 (06) :2193-2196
[9]   EFFECTS OF AVALANCHE INJECTION OF ELECTRONS INTO SILICON DIOXIDE - GENERATION OF FAST AND SLOW INTERFACE STATES [J].
LAI, SK ;
YOUNG, DR .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (10) :6231-6240
[10]   COMPARISON OF INTERFACE-STATE GENERATION BY 25-KEV ELECTRON-BEAM IRRADIATION IN P-TYPE AND N-TYPE MOS CAPACITORS [J].
MA, TP ;
SCOGGAN, G ;
LEONE, R .
APPLIED PHYSICS LETTERS, 1975, 27 (02) :61-63