LASER DIAGNOSTICS OF A SILANE PLASMA - SIH RADICALS IN AN A-SI-H CHEMICAL VAPOR-DEPOSITION SYSTEM

被引：38

作者：

MATSUMI, Y

HAYASHI, T

YOSHIKAWA, H

KOMIYA, S

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期

关键词：

D O I：

10.1116/1.573938

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1786 / 1790

页数：5

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Hata N., 1983, Proceedings of the International Ion Engineering Congress. The 7th Symposium (1983 International) on Ion Sources and Ion Assisted Technology (ISIAT '83) and the 4th International Conference on Ion and Plasma Assisted Techniques (IPAT '83), P1457

[5] NEUTRAL RADICAL DETECTION IN SILANE GLOW-DISCHARGE PLASMA USING COHERENT ANTI-STOKES RAMAN-SPECTROSCOPY [J].