LASER-INDUCED SELECTIVE DEPOSITION OF MICRON-SIZE STRUCTURES ON SILICON

[1] Bauerle D., 1983, Laser Diagnostics and Photochemical Processing for Semiconductor Devices. Proceedings of a Symposium, P19

[2] BERKELEY JF, 1967, J ELECTROCHEM SOC, V114, P701

[3] SELECTIVE LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (06) : 1427 - 1433

[4] KINETICS OF TUNGSTEN DEPOSITION BY REACTION OF WF6 AND HYDROGEN [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (09) : 1534 - 1543

[5] RAMAN MICROPROBE ANALYSIS OF TUNGSTEN SILICIDE [J]. APPLIED PHYSICS LETTERS, 1985, 46 (11) : 1076 - 1078

[6] EHRLICH DJ, 1984, APPL PHYS LETT, V44, P267, DOI 10.1063/1.94694

[7] SPATIALLY DELINEATED GROWTH OF METAL-FILMS VIA PHOTOCHEMICAL PRE-NUCLEATION [J]. APPLIED PHYSICS LETTERS, 1981, 38 (11) : 946 - 948

[8] EHRLICH DJ, 1983, LASER DIAGNOSTICS PH, P1

[9] Herman I. P., 1983, Laser Diagnostics and Photochemical Processing for Semiconductor Devices. Proceedings of a Symposium, P9

[10] LIU YS, 1984, P LASER CHEM PROCESS, P73

[1] Bauerle D., 1983, Laser Diagnostics and Photochemical Processing for Semiconductor Devices. Proceedings of a Symposium, P19

[2] BERKELEY JF, 1967, J ELECTROCHEM SOC, V114, P701

[3] SELECTIVE LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (06) : 1427 - 1433

[4] KINETICS OF TUNGSTEN DEPOSITION BY REACTION OF WF6 AND HYDROGEN [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (09) : 1534 - 1543

[5] RAMAN MICROPROBE ANALYSIS OF TUNGSTEN SILICIDE [J]. APPLIED PHYSICS LETTERS, 1985, 46 (11) : 1076 - 1078

[6] EHRLICH DJ, 1984, APPL PHYS LETT, V44, P267, DOI 10.1063/1.94694

[7] SPATIALLY DELINEATED GROWTH OF METAL-FILMS VIA PHOTOCHEMICAL PRE-NUCLEATION [J]. APPLIED PHYSICS LETTERS, 1981, 38 (11) : 946 - 948

[8] EHRLICH DJ, 1983, LASER DIAGNOSTICS PH, P1

[9] Herman I. P., 1983, Laser Diagnostics and Photochemical Processing for Semiconductor Devices. Proceedings of a Symposium, P9

[10] LIU YS, 1984, P LASER CHEM PROCESS, P73