CHARACTERIZATION OF ELECTRON-BEAM DEPOSITED TUNGSTEN FILMS ON SAPPHIRE AND SILICON

被引：35

作者：

SOUK, JH

OHANLON, JF

ANGILLELO, J

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.572866

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2289 / 2292

页数：4

共 12 条

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