ION-SOURCE WITH PLASMA CATHODE FOR ION ASSISTED DEPOSITION

被引：6

作者：

SHIONO, T ^{[1
]}

SHIBUYA, T ^{[1
]}

HARANO, Y ^{[1
]}

YABE, E ^{[1
]}

TAKAYAMA, K ^{[1
]}

机构：

[1] TOKAI UNIV,INST RES & DEV,HIRATSUKA,KANAGAWA 25912,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 37-8卷

关键词：

D O I：

10.1016/0168-583X(89)90160-2

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：166 / 168

页数：3

共 15 条

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SIE, SH .

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[6]

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[8] PROTECTIVE DIELECTRIC COATINGS PRODUCED BY ION-ASSISTED DEPOSITION [J].

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[9]

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[10]

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