CONTROLLED DEGRADATION AND ABLATION OF POLYMER SURFACES BY ULTRAVIOLET-LASER RADIATION

被引：16

作者：

SRINIVASAN, R

机构：

[1] IBM, Yorktown Heights, NY, USA, IBM, Yorktown Heights, NY, USA

来源：

POLYMER DEGRADATION AND STABILITY | 1987年 / 17卷 / 03期

关键词：

D O I：

10.1016/0141-3910(87)90063-2

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：193 / 203

页数：11

共 33 条

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J].

ANDREW, JE ;

DYER, PE ;

FORSTER, D ;

KEY, PH .

APPLIED PHYSICS LETTERS, 1983, 43 (08) :717-719

[2]

BLUM SE, 1983, Patent No. 4414059

[3] EXCIMER LASER ETCHING OF POLYIMIDE [J].

BRANNON, JH ;

LANKARD, JR ;

BAISE, AI ;

BURNS, F ;

KAUFMAN, J .

JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) :2036-2043

[4]

BRAREN B, 1986, J POLYM SCI LETT, V24, P409

[5] DEPENDENCE OF PHOTOETCHING RATES OF POLYMERS AT 193 NM ON OPTICAL-ABSORPTION DEPTH [J].

COLE, HS ;

LIU, YS ;

PHILIPP, HR .

APPLIED PHYSICS LETTERS, 1986, 48 (01) :76-77

[6] VELOCITY DISTRIBUTION OF MOLECULAR FRAGMENTS FROM POLYMETHYLMETHACRYLATE IRRADIATED WITH UV LASER-PULSES [J].

DANIELZIK, B ;

FABRICIUS, N ;

ROWEKAMP, M ;

VONDERLINDE, D .

APPLIED PHYSICS LETTERS, 1986, 48 (03) :212-214

[7] SPECTROSCOPIC STUDIES OF ARF LASER PHOTOABLATION OF PMMA [J].

DAVIS, GM ;

GOWER, MC ;

FOTAKIS, C ;

EFTHIMIOPOULOS, T ;

ARGYRAKIS, P .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 36 (01) :27-30

[8] SELF-DEVELOPING UV PHOTORESIST USING EXCIMER LASER EXPOSURE [J].

DEUTSCH, TF ;

GEIS, MW .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) :7201-7204

[9] EXCIMER LASER ABLATION AND THERMAL COUPLING EFFICIENCY TO POLYMER-FILMS [J].

DYER, PE ;

SIDHU, J .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (04) :1420-1422

[10] NANOSECOND PHOTOACOUSTIC STUDIES ON ULTRAVIOLET-LASER ABLATION OF ORGANIC POLYMERS [J].

DYER, PE ;

SRINIVASAN, R .

APPLIED PHYSICS LETTERS, 1986, 48 (06) :445-447

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