THE ROLE OF SURFACE-REACTIONS IN MONOSILANE PYROLYSIS

[1] BUSS RJ, IN PRESS

[2] STUDY OF PYROLYSIS OF MONOSILANS BETWEEN 480 AND 580 DEGREES C [J]. JOURNAL DE CHIMIE PHYSIQUE ET DE PHYSICO-CHIMIE BIOLOGIQUE, 1974, 71 (10) : 1363 - 1370

[3] ADSORPTION-KINETICS OF SIH4, SI2H6 AND SI3H8 ON THE SI(111)-(7X7) SURFACE [J]. SURFACE SCIENCE, 1988, 195 (1-2) : 307 - 329

[4] CHEMISORPTION OF SILANES ON THE SI(111)-(7X7) SURFACE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 628 - 630

[5] HASE WL, 1973, QCPE, V11, P234

[6] The thermal decomposition of silane [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1936, 58 : 108 - 112

[7] LASER POWERED HOMOGENEOUS PYROLYSIS OF SILANE [J]. CHEMICAL PHYSICS LETTERS, 1985, 117 (05) : 495 - 499

[8] COMMENT ON SILANE PYROLYSIS AND THE INSERTION OF SILYLENE INTO MOLECULAR-HYDROGEN [J]. JOURNAL OF CHEMICAL PHYSICS, 1987, 86 (05) : 3057 - 3058

[9] ABSOLUTE RATE CONSTANTS FOR THE REACTION OF SILYLENE WITH HYDROGEN, SILANE, AND DISILANE [J]. JOURNAL OF CHEMICAL PHYSICS, 1988, 88 (03) : 1678 - 1687

[10] MECHANISTIC STUDIES OF CHEMICAL VAPOR-DEPOSITION [J]. ANNUAL REVIEW OF PHYSICAL CHEMISTRY, 1987, 38 : 109 - 140

[1] BUSS RJ, IN PRESS

[2] STUDY OF PYROLYSIS OF MONOSILANS BETWEEN 480 AND 580 DEGREES C [J]. JOURNAL DE CHIMIE PHYSIQUE ET DE PHYSICO-CHIMIE BIOLOGIQUE, 1974, 71 (10) : 1363 - 1370

[3] ADSORPTION-KINETICS OF SIH4, SI2H6 AND SI3H8 ON THE SI(111)-(7X7) SURFACE [J]. SURFACE SCIENCE, 1988, 195 (1-2) : 307 - 329

[4] CHEMISORPTION OF SILANES ON THE SI(111)-(7X7) SURFACE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 628 - 630

[5] HASE WL, 1973, QCPE, V11, P234

[6] The thermal decomposition of silane [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1936, 58 : 108 - 112

[7] LASER POWERED HOMOGENEOUS PYROLYSIS OF SILANE [J]. CHEMICAL PHYSICS LETTERS, 1985, 117 (05) : 495 - 499

[8] COMMENT ON SILANE PYROLYSIS AND THE INSERTION OF SILYLENE INTO MOLECULAR-HYDROGEN [J]. JOURNAL OF CHEMICAL PHYSICS, 1987, 86 (05) : 3057 - 3058

[9] ABSOLUTE RATE CONSTANTS FOR THE REACTION OF SILYLENE WITH HYDROGEN, SILANE, AND DISILANE [J]. JOURNAL OF CHEMICAL PHYSICS, 1988, 88 (03) : 1678 - 1687

[10] MECHANISTIC STUDIES OF CHEMICAL VAPOR-DEPOSITION [J]. ANNUAL REVIEW OF PHYSICAL CHEMISTRY, 1987, 38 : 109 - 140