STUDIES ON AL2O3-TI-MO-AU METALLIZATION SYSTEM

[1] APPLICATION OF MEV BACKSCATTERING TO THIN-FILM DIFFUSION PROBLEMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 448 - 448

[2] PRINCIPLES AND APPLICATIONS OF ION-BEAM TECHNIQUES FOR ANALYSIS OF SOLIDS AND THIN-FILMS [J]. THIN SOLID FILMS, 1973, 17 (01) : 1 - 41

[3] Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700

[4] HIRT JP, 1969, PHYS THIN FILMS, V4, P60

[5] KINETICS OF SILICIDE FORMATION BY THIN-FILMS OF V ON SI AND SIO2 SUBSTRATES [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (08) : 3304 - 3308

[6] MCDONALD RR, 1970, ASTRONAUT AERONAUT, V8, P36

[7] RHODES W, 1971, NBS348 SPEC PUB, P271

[8] SCHNABLE GL, 1967, 6 ANN REL PHYS S LOS, P170

[9] COMPOSITE FILM INTERFACE CONTROL BY SEQUENTIAL SPUTTERING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 71 - 71

[10] RELATIONSHIP BETWEEN SUBSTRATE SURFACE CHEMISTRY AND ADHESION OF THIN-FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01): : 181 - &

[1] APPLICATION OF MEV BACKSCATTERING TO THIN-FILM DIFFUSION PROBLEMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 448 - 448

[2] PRINCIPLES AND APPLICATIONS OF ION-BEAM TECHNIQUES FOR ANALYSIS OF SOLIDS AND THIN-FILMS [J]. THIN SOLID FILMS, 1973, 17 (01) : 1 - 41

[3] Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700

[4] HIRT JP, 1969, PHYS THIN FILMS, V4, P60

[5] KINETICS OF SILICIDE FORMATION BY THIN-FILMS OF V ON SI AND SIO2 SUBSTRATES [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (08) : 3304 - 3308

[6] MCDONALD RR, 1970, ASTRONAUT AERONAUT, V8, P36

[7] RHODES W, 1971, NBS348 SPEC PUB, P271

[8] SCHNABLE GL, 1967, 6 ANN REL PHYS S LOS, P170

[9] COMPOSITE FILM INTERFACE CONTROL BY SEQUENTIAL SPUTTERING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 71 - 71

[10] RELATIONSHIP BETWEEN SUBSTRATE SURFACE CHEMISTRY AND ADHESION OF THIN-FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01): : 181 - &