REDUCTION OF RECOMBINATION-ENHANCED DIFFUSION OF BE IN INGAAS STRAINED LAYER

被引:9
作者
UEMATSU, M
WADA, K
机构
[1] NTT LSI Laboratories, Atsugi-shi, Kanagawa 243-01, 3-1, Morinosato Wakamiya
关键词
D O I
10.1063/1.107579
中图分类号
O59 [应用物理学];
学科分类号
摘要
An InGaAs strained layer introduced into the p-n junction of Esaki tunnel diodes has been found to reduce the current-induced degradation of the diodes, that is, recombination-enhanced impurity diffusion (REID) of Be. The Be REID coefficients for diodes with the InGaAs strained layer are about two orders of magnitude smaller than those without the strained layer. This suggests that the strained layer reduces the recombination-enhanced process, which is consistent with the results for InGaAs strained-layer lasers.
引用
收藏
页码:1322 / 1323
页数:2
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