FUNDAMENTAL MECHANISMS IN SILANE PLASMA DECOMPOSITIONS AND AMORPHOUS-SILICON DEPOSITION

被引：73

作者：

SCHMITT, JPM

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1983年 / 59-6卷 / DEC期

关键词：

D O I：

10.1016/0022-3093(83)90257-0

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：649 / 657

页数：9

相关论文

共 65 条

[1] RADIATION FROM CH4 AND C2H4 PRODUCED BY ELECTRON IMPACT
AARTS, JFM
BEENAKKER, CI
DEHEER, FJ
[J]. PHYSICA, 1971, 53 (01): : 32 - +
[2] RATE CONSTANTS FOR REACTIONS OF HYDROGEN-ATOMS WITH SOME SILANES AND GERMANES
AUSTIN, ER
LAMPE, FW
[J]. JOURNAL OF PHYSICAL CHEMISTRY, 1977, 81 (12) : 1134 - 1138
[3] Austin W.E., 1976, QUADRUPOLE MASS SPEC
[4] CATHERINE Y, 1979, THIN SOLID FILMS, V60, P147
[5] POSITIVE-ION BOMBARDMENT OF SUBSTRATES IN RF DIODE GLOW-DISCHARGE SPUTTERING
COBURN, JW
KAY, E
[J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (12) : 4965 - 4971
[6] ION ENERGIES AT CATHODE OF A GLOW DISCHARGE
DAVIS, WD
VANDERSLICE, TA
[J]. PHYSICAL REVIEW, 1963, 131 (01): : 219 - &
[7] EVIDENCE FOR A TIME-DEPENDENT EXCITATION PROCESS IN SILANE RADIO-FREQUENCY GLOW-DISCHARGES
DEROSNY, G
MOSBURG, ER
ABELSON, JR
DEVAUD, G
KERNS, RC
[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) : 2272 - 2275
[8] MOLECULAR DISSOCIATION BY ELECTRON-IMPACT - OPTICAL EMISSION FROM FRAGMENTS OF METHANE, ETHYLENE, AND METHANOL
DONOHUE, DE
SCHIAVONE, JA
FREUND, RS
[J]. JOURNAL OF CHEMICAL PHYSICS, 1977, 67 (02) : 769 - 780
[9] GROWTH OF HYDROGENATED AMORPHOUS-SILICON DUE TO CONTROLLED ION-BOMBARDMENT FROM A PURE SILANE PLASMA
DREVILLON, B
PERRIN, J
SIEFERT, JM
HUC, J
LLORET, A
DEROSNY, G
SCHMITT, JPM
[J]. APPLIED PHYSICS LETTERS, 1983, 42 (09) : 801 - 803
[10] DREVILLON B, 1980, APPL PHYS LETT, V37, P177

← 1 2 3 4 5 6 7 →