PREPARATION OF ALUMINUM NITRIDE THIN-FILMS BY REACTIVE SPUTTERING AND THEIR APPLICATIONS TO GHZ-BAND SURFACE-ACOUSTIC-WAVE DEVICES

被引:119
作者
OKANO, H
TANAKA, N
TAKAHASHI, Y
TANAKA, T
SHIBATA, K
NAKANO, S
机构
[1] Functional Materials Research Center, Sanyo Electric Co., Ltd., 1-18-13, Hashiridani, Hirakata, Osaka
关键词
D O I
10.1063/1.111553
中图分类号
O59 [应用物理学];
学科分类号
摘要
Single crystal aluminum nitride (ALN) thin films were prepared by a low-temperature reactive sputtering on basal plane sapphire [(001)Al2O3] at a substrate temperature of less than 315 degrees C. Surface acoustic wave (SAW) characteristics with an interdigital transducer /(001)AlN/(001)Al2O3 structure were investigated. The phase velocity and temperature coefficient of delay time are 5750-5765 m/s and 55-63 ppm/degrees C at KH=1.2-1.6, respectively. Resonator-type 1-GHz-band SAW filters with its structure were fabricated. The insertion loss and suppression were 23 dB and more than 20 dB, respectively.
引用
收藏
页码:166 / 168
页数:3
相关论文
共 13 条