PREPARATION OF YSZ LAYERS BY MOCVD - INFLUENCE OF EXPERIMENTAL PARAMETERS ON THE MORPHOLOGY OF THE FILMS

被引：23

作者：

GARCIA, G

CASADO, J

LLIBRE, J

FIGUERAS, A

机构：

[1] CSIC,ICMAB,E-08193 BARCELONA,SPAIN

[2] SE CARBUROS MET,E-08038 BARCELONA,SPAIN

来源：

JOURNAL OF CRYSTAL GROWTH | 1995年 / 156卷 / 04期

关键词：

D O I：

10.1016/0022-0248(95)00285-5

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

This paper deals with the preparation of yttria-stabilized zirconia (YSZ) layers by MOCVD, using Y(thd)(3) and Zr(thd)(4) as metalorganic precursors. Activation energies of the evaporation process were measured for both precursors. Thermogravimetric and mass spectrometric analysis proved that these precursors are suitable for MOCVD. Fully and partially stabilized zirconia was obtained by changing the composition of the gas phase. The influence of the deposition temperature on the morphology and preferential orientation in the crystallization has also been studied.

引用

页码：426 / 432

页数：7

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