REACTIVE SPUTTERING OF ZIRCONIUM WITH OXYGEN

被引：6

作者：

BLICKENSDERFER, R ^{[1
]}

LINCOLN, RL ^{[1
]}

ROMANS, PA ^{[1
]}

机构：

[1] US DEPT INTERIOR, BUR MINES, ALBANY MET RES CTR, ALBANY, OR 97321 USA

来源：

关键词：

D O I：

10.1016/0040-6090(76)90596-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：L73 / L75

页数：3

共 13 条

[1] DEPOSITION RATE OF METALLIC THIN-FILMS IN REACTIVE SPUTTERING PROCESS
ABE, T
YAMASHINA, T
[J]. THIN SOLID FILMS, 1975, 30 (01) : 19 - 27
[2] CESIUM ION SPUTTERING OF ALUMINUM
ANDREWS, AE
HASSELTINE, EH
OLSON, NT
SMITH, HP
[J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (09) : 3344 - +
[3] BISHOP HE, 1973, J PHYS D, V6, P1143
[4] CANTAGREL M, 1973, J MATER SCI, V8, P1711, DOI 10.1007/BF02403521
[5] DIELECTRIC THIN FILMS THROUGH RF SPUTTERING
DAVIDSE, PD
MAISSEL, LI
[J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (02) : 574 - &
[6] GERAGHTY KG, 1974, 2788 LAWR BERK LAB R
[7] GREINER JH, 1974, J APPL PHYS, V45, P32, DOI 10.1063/1.1662979
[8] CESIUM-ION BOMBARDMENT OF ALUMINUM OXIDE IN A CONTROLLED OXYGEN ENVIRONMENT
HASSELTINE, EH
HURLBUT, FC
OLSON, NT
SMITH, HP
[J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (11) : 4313 - +
[9] REACTIVE SPUTTERING OF METALS IN OXIDIZING ATMOSPHERES
HELLER, J
[J]. THIN SOLID FILMS, 1973, 7 (02) : 163 - 176
[10] EFFECT OF OXYGEN ON RF-SPUTTERING RATE OF SIO2
JONES, RE
WINTERS, HF
MAISSEL, LI
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1968, 5 (03): : 84 - &