X-RAY TOPOGRAPHY STUDY OF THE CLEAVED SI-(111)-FACE

被引：8

作者：

GRONWALD, KD

HENZLER, M

机构：

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1984年 / 34卷 / 04期

关键词：

D O I：

10.1007/BF00616582

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：253 / 261

页数：9

相关论文

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