THE EFFECT OF SURFACE PREPARATION ON THE PRODUCTION OF LOW INTERFACIAL CHARGE REGROWN INTERFACES

被引：23

作者：

KUECH, TF

MARSHALL, E

SCILLA, GJ

POTEMSKI, R

RANSOM, CM

HUNG, MY

机构：

来源：

JOURNAL OF CRYSTAL GROWTH | 1986年 / 77卷 / 1-3期

关键词：

D O I：

10.1016/0022-0248(86)90349-0

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：539 / 545

页数：7

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