ABSOLUTE DENSITY DETERMINATION OF CH RADICALS IN A METHANE PLASMA

被引:20
作者
JACOB, W
ENGELHARD, M
MOLLER, W
KOCH, A
机构
[1] Max-Planck-Institut für Plasmaphysik, EURATOM Association, D-85740 Garching
[2] Lehrstuhl für Messtechnik, Univ. des Saarlandes, D-66041 Saarbrücken
关键词
D O I
10.1063/1.110949
中图分类号
O59 [应用物理学];
学科分类号
摘要
Laser-induced fluorescence was applied at the B-X transition of the CH radical to measure absolute densities of the CH radicals in an electron cyclotron resonance methane plasma. The absolute experimental uncertainty is only about 30% due to a new calibration procedure. The CH density correlates well with optical emission from the CH A-X and B-X transitions over a wide pressure range. Experimental results are in satisfactory agreement with predictions from a model based on rate equations for the electron-induced dissociation and ionization of the parent methane gas. This model also includes the interaction of the plasma species with the surrounding walls and the particle transport due to pumping.
引用
收藏
页码:971 / 973
页数:3
相关论文
共 15 条
[1]  
Angus J.C., 1986, PLASMA DEPOSITED THI, P89
[2]   DIAGNOSTICS AND MODELING OF ECRH MICROWAVE DISCHARGES [J].
BEHRINGER, K .
PLASMA PHYSICS AND CONTROLLED FUSION, 1991, 33 (09) :997-1028
[3]   ON THE TEMPERATURE-DEPENDENCE OF PLASMA POLYMERIZATION [J].
DEUTSCH, H ;
KERSTEN, H ;
KLAGGE, S ;
RUTSCHER, A .
CONTRIBUTIONS TO PLASMA PHYSICS, 1988, 28 (02) :149-155
[4]  
ENGELHARD M, 1993, THESIS TU MUNICH
[5]  
ENGELHARD M, 1993, P ISPC 11 LOUGHBOROU, P1392
[6]   ON THE TEMPERATURE-DEPENDENCE OF THE DEPOSITION RATE OF AMORPHOUS, HYDROGENATED CARBON-FILMS [J].
KERSTEN, H ;
KROESEN, GMW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (01) :38-42
[7]   ELECTRON AND CHEMICAL-KINETICS IN METHANE RF GLOW-DISCHARGE DEPOSITION PLASMAS [J].
KLINE, LE ;
PARTLOW, WD ;
BIES, WE .
JOURNAL OF APPLIED PHYSICS, 1989, 65 (01) :70-78
[8]   PLASMA AND SURFACE MODELING OF THE DEPOSITION OF HYDROGENATED CARBON-FILMS FROM LOW-PRESSURE METHANE PLASMAS [J].
MOLLER, W .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1993, 56 (06) :527-546
[9]  
MOLLER W, 1993, P ISPC11, P1662
[10]   INFLUENCE OF A DIRECT-CURRENT BIAS ON THE ENERGY OF IONS FROM AN ELECTRON-CYCLOTRON RESONANCE PLASMA [J].
REINKE, P ;
SCHELZ, S ;
JACOB, W ;
MOLLER, W .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (03) :434-438