ATOMIC DESORPTION OF CHLORINE ADSORBED ON SI(111) WITH A SCANNING TUNNELING MICROSCOPE

被引：11

作者：

BABA, M

MATSUI, S

机构：

[1] Fundamental Research Laboratories, NEC Corporation, Tsukuba, Ibaraki 305, 34, Miyukigaoka

来源：

APPLIED PHYSICS LETTERS | 1994年 / 64卷 / 21期

关键词：

D O I：

10.1063/1.111447

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This letter reports the selective atomic desorption of Cl atoms adsorbed on an Si(111)7 X 7 surface by field evaporation using a scanning tunneling microscope (STM). After using STM to study the reaction of the Cl on the surface, the STM tip is placed on the adsorbed Cl and pulse voltage is applied. This results in selective atomic desorption of Cl. Although both desorption and readsorption are observed at a low pulse voltage of +4 - +6 V, only desorption occurs at a high pulse voltage over +6 V

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页码：2852 / 2854

页数：3

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