SURFACE AND THIN-FILM ANALYSIS IN SILICON TECHNOLOGY - ACTUAL AND FUTURE-PROBLEMS AND DEMANDS

被引：24

作者：

KOLBESEN, BO

PAMLER, W

机构：

来源：

FRESENIUS ZEITSCHRIFT FUR ANALYTISCHE CHEMIE | 1989年 / 333卷 / 4-5期

关键词：

D O I：

10.1007/BF00572377

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：561 / 568

页数：8

共 43 条

[1] INVESTIGATION OF TIN FILMS REACTIVELY SPUTTERED USING A SPUTTER GUN
AHN, KY
WITTMER, M
TING, CY
[J]. THIN SOLID FILMS, 1983, 107 (01) : 45 - 54
[2] PHOTOELECTRON SPECTROMICROSCOPY
BEAMSON, G
PORTER, HQ
TURNER, DW
[J]. NATURE, 1981, 290 (5807) : 556 - 561
[3] BEINVOGL W, 1987, ITG FACHBERICHTE, V98, P5
[4] BEINVOGL W, 1989, IN PRESS FESTKORPERP, V28
[5] BOHM HJ, 1987, J APPL PHYS, V62, P2784, DOI 10.1063/1.339407
[6] Briggs D., 1983, PRACTICAL SURFACE AN, P87
[7] Carr T. W., 1984, PLASMA CHROMATOGRAPH
[8] RECENT DEVELOPMENTS IN SPATIALLY RESOLVED ESCA
CHANEY, RL
[J]. SURFACE AND INTERFACE ANALYSIS, 1987, 10 (01) : 36 - 47
[9] CHEUNG NW, 1980, P S THIN FILM INTERF, V80, P323
[10] DETERMINATION OF REDUCED THICKNESS D-LAMBDA OF THIN-LAYERS BY MEANS OF X-RAY PHOTOELECTRON-SPECTROSCOPY
EBEL, MF
[J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1978, 14 (04) : 287 - 322