ELECTRICAL STUDY OF SCHOTTKY-BARRIER HEIGHTS ON ATOMICALLY CLEAN AND AIR-EXPOSED N-INP (110) SURFACES

被引:84
作者
NEWMAN, N
KENDELEWICZ, T
BOWMAN, L
SPICER, WE
机构
关键词
D O I
10.1063/1.95749
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1176 / 1178
页数:3
相关论文
共 20 条
[1]   THE STRUCTURE AND PROPERTIES OF METAL-SEMICONDUCTOR INTERFACES [J].
Brillson, L. J. .
SURFACE SCIENCE REPORTS, 1982, 2 (02) :123-326
[2]   FERMI-LEVEL PINNING AND CHEMICAL-STRUCTURE OF INP-METAL INTERFACES [J].
BRILLSON, LJ ;
BRUCKER, CF ;
KATNANI, AD ;
STOFFEL, NG ;
DANIELS, R ;
MARGARITONDO, G .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (02) :564-569
[3]   SURFACE-DEFECTS AND FERMI-LEVEL PINNING IN INP [J].
DOW, JD ;
ALLEN, RE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :659-661
[4]   SCHOTTKY BARRIERS - AN EFFECTIVE WORK FUNCTION MODEL [J].
FREEOUF, JL ;
WOODALL, JM .
APPLIED PHYSICS LETTERS, 1981, 39 (09) :727-729
[5]  
HOKELEK E, 1982, APPL PHYS LETT, V40, P427
[6]   SYSTEMATICS OF INTERFACIAL CHEMICAL-REACTIONS ON INP(110) [J].
KENDELEWICZ, T ;
PETRO, WG ;
LINDAU, I ;
SPICER, WE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (03) :453-458
[7]  
KOROTCHENKOV GS, 1978, SOV PHYS SEMICOND+, V12, P141
[8]  
LIST RS, J VAC SCI TECHNOL
[9]  
NEWMAN N, SOLID STATE ELECTRON
[10]  
Rhoderick E H, 1980, METAL SEMICONDUCTOR