THERMAL RELAXATION KINETICS OF STRAINED SI/SI1-XGEX HETEROSTRUCTURES DETERMINED BY DIRECT MEASUREMENT OF MOSAICITY AND LATTICE-PARAMETER VARIATIONS

被引：16

作者：

SARDELA, MR ^{[1
]}

HANSSON, GV ^{[1
]}

机构：

[1] LINKOPING UNIV, DEPT PHYS, S-58183 LINKOPING, SWEDEN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1995年 / 13卷 / 02期

关键词：

D O I：

10.1116/1.579416

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：314 / 326

页数：13

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