MASS-SPECTROMETRIC DETECTION OF S2F AND S2F2 IN SF6O2(-18) RF DISCHARGES

被引：18

作者：

SNIJKERS, RJMM ^{[1
]}

COULON, JF ^{[1
]}

TURBAN, G ^{[1
]}

机构：

[1] EINDHOVEN UNIV TECHNOL,POB 513,5600 MB EINDHOVEN,NETHERLANDS

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1991年 / 24卷 / 07期

关键词：

PLASMA-ETCHING DISCHARGES; SULFUR DIMERS; SF6; SILICON; MIXTURES; TUNGSTEN; MODEL; SIO2;

D O I：

10.1088/0022-3727/24/7/011

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In SF6 - O-18(2) discharges, mass spectrometric studies have clearly shown the presence of S2F and S2F2 molecules in the case of the use of fluorine consuming materials. Reaction schemes are proposed to explain the formation of S2F and S2F2 molecules. These reaction paths also lead to the S2 molecule.

引用

页码：1098 / 1101

页数：4

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