KINETICS AND MECHANISMS OF CHEMICAL-REACTIONS IN NON-EQUILIBRIUM PLASMA-ETCHING OF SILICON AND SILICON-COMPOUNDS

被引：20

作者：

VINOGRADOV, GK

NEVZOROV, PI

POLAK, LS

SLOVETSKY, DI

机构：

来源：

VACUUM | 1982年 / 32卷 / 09期

关键词：

D O I：

10.1016/0042-207X(82)93782-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：529 / 537

页数：9

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