LASER-CONTROLLED CHEMICAL ETCHING OF ALUMINUM

[1] Alferov Zh. I., 1976, Soviet Physics - Technical Physics, V21, P857

[2] Bockris J. O. M., 1970, MODERN ELECTROCHEMIS, V2

[3] SUBMICROMETER-LINEWIDTH DOPING AND RELIEF DEFINITION IN SILICON BY LASER-CONTROLLED DIFFUSION [J]. APPLIED PHYSICS LETTERS, 1982, 41 (03) : 297 - 299

[4] LASER PHOTOCHEMICAL MICROALLOYING FOR ETCHING OF ALUMINUM THIN-FILMS [J]. APPLIED PHYSICS LETTERS, 1981, 38 (06) : 399 - 401

[5] INHIBITORS OF CORROSION OF ALUMINUM [J]. INDUSTRIAL AND ENGINEERING CHEMISTRY, 1945, 37 (08): : 736 - 741

[6] EVANS UR, 1960, CORROSION OXIDATION, pCH5

[7] FONTANA MG, 1978, CORROSION ENG, P198

[8] Haasen P., 1978, PHYS METALLURGY CAMB, P183

[9] CHEMICAL ETCHING OF GERMANIUM WITH H3PO4-H2O2-H2O SOLUTION [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (11): : 1616 - 1618

[10] MATASA CG, 1978, P CORROSION 78 M NAT

[1] Alferov Zh. I., 1976, Soviet Physics - Technical Physics, V21, P857

[2] Bockris J. O. M., 1970, MODERN ELECTROCHEMIS, V2

[3] SUBMICROMETER-LINEWIDTH DOPING AND RELIEF DEFINITION IN SILICON BY LASER-CONTROLLED DIFFUSION [J]. APPLIED PHYSICS LETTERS, 1982, 41 (03) : 297 - 299

[4] LASER PHOTOCHEMICAL MICROALLOYING FOR ETCHING OF ALUMINUM THIN-FILMS [J]. APPLIED PHYSICS LETTERS, 1981, 38 (06) : 399 - 401

[5] INHIBITORS OF CORROSION OF ALUMINUM [J]. INDUSTRIAL AND ENGINEERING CHEMISTRY, 1945, 37 (08): : 736 - 741

[6] EVANS UR, 1960, CORROSION OXIDATION, pCH5

[7] FONTANA MG, 1978, CORROSION ENG, P198

[8] Haasen P., 1978, PHYS METALLURGY CAMB, P183

[9] CHEMICAL ETCHING OF GERMANIUM WITH H3PO4-H2O2-H2O SOLUTION [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (11): : 1616 - 1618

[10] MATASA CG, 1978, P CORROSION 78 M NAT