THE ELECTRONIC-PROPERTIES OF PLASMA-DEPOSITED FILMS OF HYDROGENATED AMORPHOUS SINX (O LESS-THAN X LESS-THAN 1.2)

被引：113

作者：

LOWE, AJ

POWELL, MJ

ELLIOTT, SR

机构：

[1] UNIV CAMBRIDGE,DEPT PHYS CHEM,CAMBRIDGE,ENGLAND

[2] PHILIPS RES LABS,REDHILL RH1 5HA,SURREY,ENGLAND

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 59卷 / 04期

关键词：

D O I：

10.1063/1.336513

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1251 / 1258

页数：8

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