REACTION PATHWAYS IN ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION (OMCVD)

被引：49

作者：

ZINN, A

NIEMER, B

KAESZ, HD

机构：

[1] Dept. of Chemistry and Biochemistry, University of California, Los Angeles

来源：

ADVANCED MATERIALS | 1992年 / 4卷 / 05期

关键词：

D O I：

10.1002/adma.19920040514

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Research News: The incorporation of heteroatom impurities derived from the ligands in organometallic chemical vapor deposition can now be avoided due to an understanding of the reaction pathways involved. The development of the technique is traced, the various mechanisms discussed, and the important questions which still have to be answered presented.

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页码：375 / 378

页数：4

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