CHEMICAL VAPOR-DEPOSITION OF METALS FOR INTEGRATED-CIRCUIT APPLICATIONS

[1] RADIATION-INDUCED TRAPPING CENTERS IN THIN SILICON DIOXIDE FILMS [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 40 (1-3) : 31 - 47

[2] ALLEN SD, 1983, NATO ADV STUDY I S B, V84, P455

[3] AMICK JA, 1971, 2ND P INT C CVD ECS, P551

[4] CHROMIUM DEPOSITION FROM DICUMENE-CHROMIUM TO FORM METAL-SEMICONDUCTOR DEVICES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (01) : 163 - +

[5] ANDERSON HJ, 1971, 2ND P INT C CVD NEW, P355

[6] [Anonymous], 1949, CHEM ENG, V56, P118

[7] [Anonymous], UNPUB

[8] BARNETT GD, 1962, P C METALLURGY ADV E, P263

[9] TANTALUM COATING OF MILD-STEEL BY CHEMICAL VAPOR-DEPOSITION [J]. THIN SOLID FILMS, 1977, 46 (02) : 209 - 212

[10] VAPOR-PHASE DEPOSITION OF ALUMINUM FILM ON QUARTZ SUBSTRATE [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (01) : 234 - 236

[1] RADIATION-INDUCED TRAPPING CENTERS IN THIN SILICON DIOXIDE FILMS [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 40 (1-3) : 31 - 47

[2] ALLEN SD, 1983, NATO ADV STUDY I S B, V84, P455

[3] AMICK JA, 1971, 2ND P INT C CVD ECS, P551

[4] CHROMIUM DEPOSITION FROM DICUMENE-CHROMIUM TO FORM METAL-SEMICONDUCTOR DEVICES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (01) : 163 - +

[5] ANDERSON HJ, 1971, 2ND P INT C CVD NEW, P355

[6] [Anonymous], 1949, CHEM ENG, V56, P118

[7] [Anonymous], UNPUB

[8] BARNETT GD, 1962, P C METALLURGY ADV E, P263

[9] TANTALUM COATING OF MILD-STEEL BY CHEMICAL VAPOR-DEPOSITION [J]. THIN SOLID FILMS, 1977, 46 (02) : 209 - 212

[10] VAPOR-PHASE DEPOSITION OF ALUMINUM FILM ON QUARTZ SUBSTRATE [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (01) : 234 - 236