VALLEY DEGENERACY AND MOBILITY ANISOTROPY UNDER MECHANICAL-STRESS ON (111) SILICON INVERSION LAYERS

被引：28

作者：

DORDA, G ^{[1
]}

GESCH, H ^{[1
]}

EISELE, I ^{[1
]}

机构：

[1] FORSCH LAB SIEMENS AG,MUNCHEN,FED REP GER

来源：

关键词：

D O I：

10.1016/0038-1098(76)90542-1

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：429 / 432

页数：4

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