共 11 条
- [3] DWIGHT DW, 1982, NASA NSG3204 REP
- [4] OXYGEN PLASMA-ETCHING OF THICK POLYMER LAYERS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03): : 743 - 747
- [5] SOME CHARACTERISTICS AND USES OF LOW-PRESSURE PLASMAS IN MATERIALS SCIENCE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 5 - 15
- [7] MAFFITT KN, 1982, Patent No. 4340276
- [8] MECHANISM OF SILICON ETCHING BY A CF4 PLASMA [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (05): : 1734 - 1738
- [9] ADHESIVE BONDING OF ION-BEAM-TEXTURED METALS AND FLUOROPOLYMERS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 809 - 812
- [10] MOGAB CJ, 1977, J ELECTROCHEM SOC, V124, P1262, DOI 10.1149/1.2133542