MOIRE SIGNALS IN REFLECTION

被引：18

作者：

CHITNIS, VT ^{[1
]}

UCHIDA, Y ^{[1
]}

HANE, K ^{[1
]}

HATTORI, S ^{[1
]}

机构：

[1] NAGOYA UNIV,DEPT ELECTR MECH ENGN,CHIKUSA KU,NAGOYA,AICHI 464,JAPAN

来源：

OPTICS COMMUNICATIONS | 1985年 / 54卷 / 04期

关键词：

D O I：

10.1016/0030-4018(85)90292-5

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：207 / 211

页数：5

共 9 条

[1] ALIGNMENT OF X-RAY LITHOGRAPHY MASKS USING A NEW INTERFEROMETRIC-TECHNIQUE - EXPERIMENTAL RESULTS [J].

AUSTIN, S ;

SMITH, HI ;

FLANDERS, DC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :984-986

[2]

Guild J., 1956, INTERFERENCE SYSTEMS

[3]

HATTORI S, UNPUB B JAPAN SOC PR

[4] PHOTOLITHOGRAPHIC MASK ALIGNMENT USING MOIRE TECHNIQUES [J].

KING, MC ;

BERRY, DH .

APPLIED OPTICS, 1972, 11 (11) :2455-&

[5] A DUAL GRATING ALIGNMENT TECHNIQUE FOR X-RAY-LITHOGRAPHY [J].

KINOSHITA, H ;

UNE, A ;

IKI, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1276-1279

[6] DOUBLE DIFFRACTION IN FRESNEL REGION [J].

KODATE, K ;

KAMIYA, T ;

KAMIYAMA, M .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1971, 10 (08) :1040-&

[7] EXPERIMENTAL EVALUATION OF INTERFEROMETRIC ALIGNMENT TECHNIQUES FOR MULTIPLE MASK REGISTRATION [J].

LYSZCZARZ, TM ;

FLANDERS, DC ;

ECONOMOU, NP ;

DEGRAFF, PD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1214-1218

[8] ALIGNMENT OF FLAT STRUCTURES VIA MOIRE INTERFERENCE FRINGES [J].

SCHWIDER, J ;

HILLER, C .

OPTICA ACTA, 1976, 23 (01) :49-61

[9] OPTICAL ULTRA-MICROMETER TECHNIQUE UTILIZING A COMPOSITE DIFFRACTION GRATING [J].

TORII, Y ;

MIZUSHIMA, Y .

OPTICS COMMUNICATIONS, 1977, 23 (01) :135-138

← 1 →