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CHEMICALLY-FORMED BUFFER LAYERS FOR GROWTH OF CUBIC SILICON-CARBIDE ON SILICON SINGLE-CRYSTALS
被引:46
作者
:
ADDAMIANO, A
论文数:
0
引用数:
0
h-index:
0
ADDAMIANO, A
KLEIN, PH
论文数:
0
引用数:
0
h-index:
0
KLEIN, PH
机构
:
来源
:
JOURNAL OF CRYSTAL GROWTH
|
1984年
/ 70卷
/ 1-2期
关键词
:
D O I
:
10.1016/0022-0248(84)90276-8
中图分类号
:
O7 [晶体学];
学科分类号
:
0702 ;
070205 ;
0703 ;
080501 ;
摘要
:
引用
收藏
页码:291 / 294
页数:4
相关论文
共 9 条
[1]
BUFFER-LAYER TECHNIQUE FOR THE GROWTH OF SINGLE-CRYSTAL SIC ON SI
ADDAMIANO, A
论文数:
0
引用数:
0
h-index:
0
ADDAMIANO, A
SPRAGUE, JA
论文数:
0
引用数:
0
h-index:
0
SPRAGUE, JA
[J].
APPLIED PHYSICS LETTERS,
1984,
44
(05)
: 525
-
527
[2]
THE FORMATION OF BETA-SIC ON SI
BALOG, M
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
BALOG, M
REISMAN, A
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
REISMAN, A
BERKENBLIT, M
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
BERKENBLIT, M
[J].
JOURNAL OF ELECTRONIC MATERIALS,
1980,
9
(03)
: 669
-
683
[3]
GROWTH MORPHOLOGY AND CRYSTALLOGRAPHIC ORIENTATION OF BETA-SIC FILMS FORMED BY CHEMICAL CONVERSION
LEARN, AJ
论文数:
0
引用数:
0
h-index:
0
LEARN, AJ
KHAN, IH
论文数:
0
引用数:
0
h-index:
0
KHAN, IH
[J].
THIN SOLID FILMS,
1970,
5
(03)
: 145
-
&
[4]
HETERO-EPITAXIAL GROWTH OF CUBIC SILICON-CARBIDE ON FOREIGN SUBSTRATES
MATSUNAMI, H
论文数:
0
引用数:
0
h-index:
0
机构:
KYOTO UNIV,FAC ENGN,DEPT ELECTR,SAYKY,KYOTO,JAPAN
KYOTO UNIV,FAC ENGN,DEPT ELECTR,SAYKY,KYOTO,JAPAN
MATSUNAMI, H
NISHINO, S
论文数:
0
引用数:
0
h-index:
0
机构:
KYOTO UNIV,FAC ENGN,DEPT ELECTR,SAYKY,KYOTO,JAPAN
KYOTO UNIV,FAC ENGN,DEPT ELECTR,SAYKY,KYOTO,JAPAN
NISHINO, S
ONO, H
论文数:
0
引用数:
0
h-index:
0
机构:
KYOTO UNIV,FAC ENGN,DEPT ELECTR,SAYKY,KYOTO,JAPAN
KYOTO UNIV,FAC ENGN,DEPT ELECTR,SAYKY,KYOTO,JAPAN
ONO, H
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1981,
28
(10)
: 1235
-
1236
[5]
CHEMICAL VAPOR-DEPOSITION OF SINGLE CRYSTALLINE BETA-SIC FILMS ON SILICON SUBSTRATE WITH SPUTTERED SIC INTERMEDIATE LAYER
NISHINO, S
论文数:
0
引用数:
0
h-index:
0
NISHINO, S
HAZUKI, Y
论文数:
0
引用数:
0
h-index:
0
HAZUKI, Y
MATSUNAMI, H
论文数:
0
引用数:
0
h-index:
0
MATSUNAMI, H
TANAKA, T
论文数:
0
引用数:
0
h-index:
0
TANAKA, T
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(12)
: 2674
-
2680
[6]
PRODUCTION OF LARGE-AREA SINGLE-CRYSTAL WAFERS OF CUBIC SIC FOR SEMICONDUCTOR-DEVICES
NISHINO, S
论文数:
0
引用数:
0
h-index:
0
NISHINO, S
POWELL, JA
论文数:
0
引用数:
0
h-index:
0
POWELL, JA
WILL, HA
论文数:
0
引用数:
0
h-index:
0
WILL, HA
[J].
APPLIED PHYSICS LETTERS,
1983,
42
(05)
: 460
-
462
[7]
Stull DR, 1971, JANAF THERMOCHEMICAL, V37
[8]
Treffers R., 1974, Astrophysical Journal, V188, P545, DOI 10.1086/152746
[9]
VOLD C, COMMUNICATION
←
1
→
共 9 条
[1]
BUFFER-LAYER TECHNIQUE FOR THE GROWTH OF SINGLE-CRYSTAL SIC ON SI
ADDAMIANO, A
论文数:
0
引用数:
0
h-index:
0
ADDAMIANO, A
SPRAGUE, JA
论文数:
0
引用数:
0
h-index:
0
SPRAGUE, JA
[J].
APPLIED PHYSICS LETTERS,
1984,
44
(05)
: 525
-
527
[2]
THE FORMATION OF BETA-SIC ON SI
BALOG, M
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
BALOG, M
REISMAN, A
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
REISMAN, A
BERKENBLIT, M
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
BERKENBLIT, M
[J].
JOURNAL OF ELECTRONIC MATERIALS,
1980,
9
(03)
: 669
-
683
[3]
GROWTH MORPHOLOGY AND CRYSTALLOGRAPHIC ORIENTATION OF BETA-SIC FILMS FORMED BY CHEMICAL CONVERSION
LEARN, AJ
论文数:
0
引用数:
0
h-index:
0
LEARN, AJ
KHAN, IH
论文数:
0
引用数:
0
h-index:
0
KHAN, IH
[J].
THIN SOLID FILMS,
1970,
5
(03)
: 145
-
&
[4]
HETERO-EPITAXIAL GROWTH OF CUBIC SILICON-CARBIDE ON FOREIGN SUBSTRATES
MATSUNAMI, H
论文数:
0
引用数:
0
h-index:
0
机构:
KYOTO UNIV,FAC ENGN,DEPT ELECTR,SAYKY,KYOTO,JAPAN
KYOTO UNIV,FAC ENGN,DEPT ELECTR,SAYKY,KYOTO,JAPAN
MATSUNAMI, H
NISHINO, S
论文数:
0
引用数:
0
h-index:
0
机构:
KYOTO UNIV,FAC ENGN,DEPT ELECTR,SAYKY,KYOTO,JAPAN
KYOTO UNIV,FAC ENGN,DEPT ELECTR,SAYKY,KYOTO,JAPAN
NISHINO, S
ONO, H
论文数:
0
引用数:
0
h-index:
0
机构:
KYOTO UNIV,FAC ENGN,DEPT ELECTR,SAYKY,KYOTO,JAPAN
KYOTO UNIV,FAC ENGN,DEPT ELECTR,SAYKY,KYOTO,JAPAN
ONO, H
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1981,
28
(10)
: 1235
-
1236
[5]
CHEMICAL VAPOR-DEPOSITION OF SINGLE CRYSTALLINE BETA-SIC FILMS ON SILICON SUBSTRATE WITH SPUTTERED SIC INTERMEDIATE LAYER
NISHINO, S
论文数:
0
引用数:
0
h-index:
0
NISHINO, S
HAZUKI, Y
论文数:
0
引用数:
0
h-index:
0
HAZUKI, Y
MATSUNAMI, H
论文数:
0
引用数:
0
h-index:
0
MATSUNAMI, H
TANAKA, T
论文数:
0
引用数:
0
h-index:
0
TANAKA, T
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(12)
: 2674
-
2680
[6]
PRODUCTION OF LARGE-AREA SINGLE-CRYSTAL WAFERS OF CUBIC SIC FOR SEMICONDUCTOR-DEVICES
NISHINO, S
论文数:
0
引用数:
0
h-index:
0
NISHINO, S
POWELL, JA
论文数:
0
引用数:
0
h-index:
0
POWELL, JA
WILL, HA
论文数:
0
引用数:
0
h-index:
0
WILL, HA
[J].
APPLIED PHYSICS LETTERS,
1983,
42
(05)
: 460
-
462
[7]
Stull DR, 1971, JANAF THERMOCHEMICAL, V37
[8]
Treffers R., 1974, Astrophysical Journal, V188, P545, DOI 10.1086/152746
[9]
VOLD C, COMMUNICATION
←
1
→