AVALANCHE INJECTION IN CDS FILMS

被引：21

作者：

CHOPRA, KL

机构：

来源：

PROCEEDINGS OF THE IEEE | 1963年 / 51卷 / 09期

关键词：

D O I：

10.1109/PROC.1963.2503

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1242 / &

共 10 条

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[2]

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[6] DOUBLE INJECTION IN INSULATORS [J].

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[7] METAL CONTACT DOUBLE INJECTION IN GAAS [J].

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PROCEEDINGS OF THE IEEE, 1963, 51 (06) :954-&

[8]

STAFEEV VI, 1959, SOV PHYS-SOL STATE, V1, P763

[9] AVALANCHE BREAKDOWN-DOUBLE INJECTION INDUCED NEGATIVE RESISTANCE IN SEMICONDUCTORS [J].

STEELE, MC ;

ANDO, K ;

LAMPERT, MA .

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1962, 17 (11) :1729-&

[10] NEGATIVE RESISTANCE AND HYSTERESIS IN A GERMANIUM-SILICON HETEROJUNCTION [J].

WEI, LY ;

SHEWCHUN, J .

PROCEEDINGS OF THE IEEE, 1963, 51 (06) :946-&

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