CURRENT AND VOLTAGE MEASUREMENTS IN THE GASEOUS ELECTRONICS CONFERENCE RF REFERENCE CELL

被引：30

作者：

SOBOLEWSKI, MA

机构：

来源：

JOURNAL OF RESEARCH OF THE NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY | 1995年 / 100卷 / 04期

关键词：

CURRENT; DIAGNOSTIC; DISCHARGE; ELECTRICAL; GASEOUS ELECTRONICS CONFERENCE; IMPEDANCE; PLASMA; RADIO FREQUENCY; VOLTAGE;

D O I：

10.6028/jres.100.026

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Measurements of the electrical characteristics of discharges in the Gaseous Electronics Conference Radio-Frequency Reference Cell are reviewed here. Topics include: common sources of error in the measurements; comparisons of current and voltage data among GEC cells; the effects of gas impurities, surface conditions and the external circuitry on the reproducibility of the electrical characteristics; and comparisons of current and voltage data with results of other measurements.

引用

页码：341 / 351

页数：11

共 24 条

[1]

DJUROVIC S, UNPUB

[2] DYNAMIC-MODEL OF THE ELECTRODE SHEATHS IN SYMMETRICALLY DRIVEN RF DISCHARGES [J].

GODYAK, VA ;

STERNBERG, N .

PHYSICAL REVIEW A, 1990, 42 (04) :2299-2312

[3]

GREENBERG KE, 1990, SETEC90013 SAND NAT

[4]

HALBRITTER J, 1992, J APPL PHYS, V53, P6475

[5] THE GASEOUS ELECTRONICS CONFERENCE RADIOFREQUENCY REFERENCE CELL - A DEFINED PARALLEL-PLATE RADIOFREQUENCY SYSTEM FOR EXPERIMENTAL AND THEORETICAL-STUDIES OF PLASMA-PROCESSING DISCHARGES [J].

HARGIS, PJ ;

GREENBERG, KE ;

MILLER, PA ;

GERARDO, JB ;

TORCZYNSKI, JR ;

RILEY, ME ;

HEBNER, GA ;

ROBERTS, JR ;

OLTHOFF, JK ;

WHETSTONE, JR ;

VANBRUNT, RJ ;

SOBOLEWSKI, MA ;

ANDERSON, HM ;

SPLICHAL, MP ;

MOCK, JL ;

BLETZINGER, P ;

GARSCADDEN, A ;

GOTTSCHO, RA ;

SELWYN, G ;

DALVIE, M ;

HEIDENREICH, JE ;

BUTTERBAUGH, JW ;

BRAKE, ML ;

PASSOW, ML ;

PENDER, J ;

LUJAN, A ;

ELTA, ME ;

GRAVES, DB ;

SAWIN, HH ;

KUSHNER, MJ ;

VERDEYEN, JT ;

HORWATH, R ;

TURNER, TR .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1994, 65 (01) :140-154

[6] MEASUREMENTS OF SECONDARY-ELECTRON EMISSION IN REACTIVE SPUTTERING OF ALUMINUM AND TITANIUM NITRIDE [J].

LEWIS, MA ;

GLOCKER, DA ;

JORNE, J .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1989, 7 (03) :1019-1024

[7] DYNAMICS OF A COLLISIONAL, CAPACITIVE RF SHEATH [J].

LIEBERMAN, MA .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 1989, 17 (02) :338-341

[8] ANALYTICAL SOLUTION FOR CAPACITIVE RF SHEATH [J].

LIEBERMAN, MA .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 1988, 16 (06) :638-644

[9]

MCMILLIN BK, UNPUB J APPL PHYS

[10]

Miller P A, 1991, P SOC PHOTO-OPT INS, V1594, P179

← 1 2 3 →