RF-MAGNETRON-SPUTTERED A1N FILMS FOR MICROWAVE ACOUSTIC RESONATORS

被引：16

作者：

KRISHNASWAMY, SV ^{[1
]}

HESTER, WA ^{[1
]}

SZEDON, JR ^{[1
]}

FRANCOMBE, MH ^{[1
]}

DRISCOLL, MM ^{[1
]}

机构：

[1] WESTINGHOUSE ELECT CORP,CTR DEF & ELECTR,BALTIMORE,MD 21203

来源：

THIN SOLID FILMS | 1985年 / 125卷 / 3-4期

关键词：

D O I：

10.1016/0040-6090(85)90235-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：291 / 298

页数：8

共 22 条

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[2]

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[3]

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[5] A QUANTITATIVE ION-BEAM PROCESS APPLIED TO THE DEPOSITION OF ALUMINUM NITRIDE THIN-FILMS [J].

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CUOMO, JJ .

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[6]

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[7]

KIU JK, 1975, J APPL PHYS, V46, P3703

[8]

LAKIN KM, 1982, 36TH P FREQ CONTR S, P346

[9] STRUCTURAL, OPTICAL, AND DIELECTRIC PROPERTIES OF REACTIVELY SPUTTERED FILMS IN SYSTEM AIN-BN [J].

NOREIKA, AJ ;

FRANCOMBE, MH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04) :722-+

[10] DIELECTRIC PROPERTIES OF REACTIVELY SPUTTERED FILMS OF ALUMINUM NITRIDE [J].

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ZEITMAN, SA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01) :194-+

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