DOSIMETRY MEASUREMENT IN ION IMPLANTERS

被引：9

作者：

JAMBA, DM

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH | 1981年 / 189卷 / 01期

关键词：

D O I：

10.1016/0029-554X(81)90152-X

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：253 / 263

页数：11

共 32 条

[1] NEW METHOD TO MONITOR THE BEAM PROFILE IN HIGH-CURRENT ION-IMPLANTATION SYSTEMS [J].

BADALEC, R ;

RUNGE, H .

JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1979, 12 (12) :1146-1147

[2] THRESHOLD SHIFTS DUE TO NONUNIFORM DOPING PROFILES IN SURFACE CHANNEL MOSFETS [J].

BREWS, JR .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (11) :1696-1710

[3]

CAMPLAN J, UNPUB NUCL INSTR MET

[4]

CARTER G, 1979, RAD EFF LETT, V42, P125

[5] ION-BEAM STUDIES .4. USE OF MULTIPLY-CHARGED AND POLYATOMIC IONS IN AN IMPLANTATION ACCELERATOR [J].

FREEMAN, JH ;

CHIVERS, DJ ;

GARD, GA .

NUCLEAR INSTRUMENTS & METHODS, 1977, 143 (01) :99-115

[6] CORRELATION BETWEEN ELECTROSTATIC SCAN PATTERN AND LOCAL DOSE NONUNIFORMITIES [J].

GLAWISCHNIG, H ;

HOERSCHELMANN, K ;

HOLTSCHMIDT, W ;

WENZIG, W .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1981, 189 (01) :291-294

[7] TECHNIQUE FOR MEASURING, DISPLAYING, RECORDING, AND MODIFYING SPATIAL UNIFORMITY OF IMPLANTED IONS [J].

HAMMER, WN ;

MICHEL, AE .

JOURNAL OF APPLIED PHYSICS, 1976, 47 (05) :2161-2164

[8] ELECTROMAGNETIC SCANNING SYSTEMS [J].

HANLEY, PR .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1981, 189 (01) :227-237

[9] ABSOLUTE DOSIMETRY OF ION-IMPLANTED IMPURITIES USING A CALORIMETRIC METHOD [J].

HEMMENT, PLF .

VACUUM, 1977, 27 (10-1) :611-616

[10] DOSIMETRY TECHNIQUES [J].

HEMMENT, PLF .

RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1979, 44 (1-4) :31-45

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