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DISSOLUTION KINETICS IN LANGMUIR-BLODGETT FILMS OF SOLID-STATE POLYMERIZED OMEGA-TRICOSENOIC ACID
被引:11
作者
:
BARRAUD, A
论文数:
0
引用数:
0
h-index:
0
BARRAUD, A
机构
:
来源
:
MOLECULAR CRYSTALS AND LIQUID CRYSTALS
|
1983年
/ 96卷
/ 1-4期
关键词
:
D O I
:
10.1080/00268948308074716
中图分类号
:
O6 [化学];
学科分类号
:
0703 ;
摘要
:
引用
收藏
页码:353 / 359
页数:7
相关论文
共 8 条
[1]
POLYMERIZED MONO-MOLECULAR LAYERS - A NEW CLASS OF ULTRATHIN RESINS FOR MICROLITHOGRAPHY
BARRAUD, A
论文数:
0
引用数:
0
h-index:
0
BARRAUD, A
ROSILIO, C
论文数:
0
引用数:
0
h-index:
0
ROSILIO, C
RUAUDELTEIXIER, A
论文数:
0
引用数:
0
h-index:
0
RUAUDELTEIXIER, A
[J].
THIN SOLID FILMS,
1980,
68
(01)
: 91
-
98
[2]
SOLID-STATE ELECTRON-INDUCED POLYMERIZATION OF OMEGA-TRICOSENOIC ACID MULTILAYERS
BARRAUD, A
论文数:
0
引用数:
0
h-index:
0
机构:
CENS,F-91190 GIF SUR YVETTE,FRANCE
CENS,F-91190 GIF SUR YVETTE,FRANCE
BARRAUD, A
ROSILIO, C
论文数:
0
引用数:
0
h-index:
0
机构:
CENS,F-91190 GIF SUR YVETTE,FRANCE
CENS,F-91190 GIF SUR YVETTE,FRANCE
ROSILIO, C
RUAUDELTEIXIER, A
论文数:
0
引用数:
0
h-index:
0
机构:
CENS,F-91190 GIF SUR YVETTE,FRANCE
CENS,F-91190 GIF SUR YVETTE,FRANCE
RUAUDELTEIXIER, A
[J].
JOURNAL OF COLLOID AND INTERFACE SCIENCE,
1977,
62
(03)
: 509
-
523
[3]
MODEL OF THE DISSOLUTION OF MONO-MOLECULAR PHOTORESISTS
BARRAUD, A
论文数:
0
引用数:
0
h-index:
0
BARRAUD, A
[J].
THIN SOLID FILMS,
1981,
85
(01)
: 77
-
85
[4]
RECENT IMPROVEMENTS IN MONO-MOLECULAR RESISTS
BARRAUD, A
论文数:
0
引用数:
0
h-index:
0
BARRAUD, A
ROSILIO, C
论文数:
0
引用数:
0
h-index:
0
ROSILIO, C
RUAUDELTEIXIER, A
论文数:
0
引用数:
0
h-index:
0
RUAUDELTEIXIER, A
[J].
THIN SOLID FILMS,
1980,
68
(01)
: 99
-
100
[5]
MODELING PROJECTION PRINTING OF POSITIVE PHOTORESISTS
DILL, FH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
DILL, FH
NEUREUTHER, AR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
NEUREUTHER, AR
TUTTLE, JA
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
TUTTLE, JA
WALKER, EJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
WALKER, EJ
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
ED22
(07)
: 456
-
464
[6]
COMPUTER-SIMULATION OF EXPOSURE AND DEVELOPMENT OF A POSITIVE PHOTORESIST
FUJIMORI, S
论文数:
0
引用数:
0
h-index:
0
机构:
Ibaraki Electrical Communication Laboratory, Tokai, Ibaraki
FUJIMORI, S
[J].
JOURNAL OF APPLIED PHYSICS,
1979,
50
(02)
: 615
-
623
[7]
DEVELOPER CHARACTERISTICS OF POLY-(METHYL METHACRYLATE) ELECTRON RESIST
GREENEICH, JS
论文数:
0
引用数:
0
h-index:
0
机构:
GM CORP,RES LABS,ELECTR DEPT,WARREN,MI 48090
GM CORP,RES LABS,ELECTR DEPT,WARREN,MI 48090
GREENEICH, JS
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(07)
: 970
-
976
[8]
Schmidt G.M.J., 1967, REACTIVITY PHOTOEXCI, P227
←
1
→
共 8 条
[1]
POLYMERIZED MONO-MOLECULAR LAYERS - A NEW CLASS OF ULTRATHIN RESINS FOR MICROLITHOGRAPHY
BARRAUD, A
论文数:
0
引用数:
0
h-index:
0
BARRAUD, A
ROSILIO, C
论文数:
0
引用数:
0
h-index:
0
ROSILIO, C
RUAUDELTEIXIER, A
论文数:
0
引用数:
0
h-index:
0
RUAUDELTEIXIER, A
[J].
THIN SOLID FILMS,
1980,
68
(01)
: 91
-
98
[2]
SOLID-STATE ELECTRON-INDUCED POLYMERIZATION OF OMEGA-TRICOSENOIC ACID MULTILAYERS
BARRAUD, A
论文数:
0
引用数:
0
h-index:
0
机构:
CENS,F-91190 GIF SUR YVETTE,FRANCE
CENS,F-91190 GIF SUR YVETTE,FRANCE
BARRAUD, A
ROSILIO, C
论文数:
0
引用数:
0
h-index:
0
机构:
CENS,F-91190 GIF SUR YVETTE,FRANCE
CENS,F-91190 GIF SUR YVETTE,FRANCE
ROSILIO, C
RUAUDELTEIXIER, A
论文数:
0
引用数:
0
h-index:
0
机构:
CENS,F-91190 GIF SUR YVETTE,FRANCE
CENS,F-91190 GIF SUR YVETTE,FRANCE
RUAUDELTEIXIER, A
[J].
JOURNAL OF COLLOID AND INTERFACE SCIENCE,
1977,
62
(03)
: 509
-
523
[3]
MODEL OF THE DISSOLUTION OF MONO-MOLECULAR PHOTORESISTS
BARRAUD, A
论文数:
0
引用数:
0
h-index:
0
BARRAUD, A
[J].
THIN SOLID FILMS,
1981,
85
(01)
: 77
-
85
[4]
RECENT IMPROVEMENTS IN MONO-MOLECULAR RESISTS
BARRAUD, A
论文数:
0
引用数:
0
h-index:
0
BARRAUD, A
ROSILIO, C
论文数:
0
引用数:
0
h-index:
0
ROSILIO, C
RUAUDELTEIXIER, A
论文数:
0
引用数:
0
h-index:
0
RUAUDELTEIXIER, A
[J].
THIN SOLID FILMS,
1980,
68
(01)
: 99
-
100
[5]
MODELING PROJECTION PRINTING OF POSITIVE PHOTORESISTS
DILL, FH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
DILL, FH
NEUREUTHER, AR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
NEUREUTHER, AR
TUTTLE, JA
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
TUTTLE, JA
WALKER, EJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
WALKER, EJ
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
ED22
(07)
: 456
-
464
[6]
COMPUTER-SIMULATION OF EXPOSURE AND DEVELOPMENT OF A POSITIVE PHOTORESIST
FUJIMORI, S
论文数:
0
引用数:
0
h-index:
0
机构:
Ibaraki Electrical Communication Laboratory, Tokai, Ibaraki
FUJIMORI, S
[J].
JOURNAL OF APPLIED PHYSICS,
1979,
50
(02)
: 615
-
623
[7]
DEVELOPER CHARACTERISTICS OF POLY-(METHYL METHACRYLATE) ELECTRON RESIST
GREENEICH, JS
论文数:
0
引用数:
0
h-index:
0
机构:
GM CORP,RES LABS,ELECTR DEPT,WARREN,MI 48090
GM CORP,RES LABS,ELECTR DEPT,WARREN,MI 48090
GREENEICH, JS
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(07)
: 970
-
976
[8]
Schmidt G.M.J., 1967, REACTIVITY PHOTOEXCI, P227
←
1
→