SATURATION OF OPTICAL DEGRADATION IN A-SI-H FILMS WITH DIFFERENT MORPHOLOGIES

被引：14

作者：

OHAGI, H ^{[1
]}

NAKATA, JI ^{[1
]}

MIYANISHI, A ^{[1
]}

IMAO, S ^{[1
]}

JEONG, M ^{[1
]}

SHIRAFUJI, J ^{[1
]}

FUJIBAYASHI, K ^{[1
]}

INUISHI, Y ^{[1
]}

机构：

[1] OSAKA UNIV, FAC ENGN, DEPT ELECT ENGN, SUITA, OSAKA 565, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1988年 / 27卷 / 12期

关键词：

D O I：

10.1143/JJAP.27.L2245

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L2245 / L2247

页数：3

共 10 条

[1] LIGHT-INDUCED DEGRADATION AND THERMAL RECOVERY OF THE PHOTOCONDUCTIVITY IN HYDROGENATED AMORPHOUS-SILICON FILMS
ESER, E
[J]. JOURNAL OF APPLIED PHYSICS, 1986, 59 (10) : 3508 - 3515
[2] KINETICS OF THE METASTABLE OPTICALLY INDUCED ELECTRON-SPIN-RESONANCE IN A-SI-H
LEE, C
OHLSEN, WD
TAYLOR, PC
ULLAL, HS
CEASAR, GP
[J]. PHYSICAL REVIEW B, 1985, 31 (01): : 100 - 105
[3] OPTICAL DEGRADATION OF A-SI-H FILMS WITH DIFFERENT MORPHOLOGY
OHAGI, H
YAMAZAKI, M
NAKATA, J
IMAO, S
SHIRAFUJI, J
FUJIBAYASHI, K
INUISHI, Y
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1988, 27 (05): : L916 - L918
[4] OHAGI H, 1987, 1987 PVSEC 3 TOK, P671
[5] EFFECT OF SUBSTRATE-TEMPERATURE ON PROPERTIES OF GLOW-DISCHARGED HYDROGENATED AMORPHOUS-SILICON
SHIRAFUJI, J
KUWAGAKI, M
SATO, T
INUISHI, Y
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1984, 23 (10): : 1278 - 1286
[6] EFFECTS OF HYDROGEN DILUTION OF SILANE ON PROPERTIES OF GLOW-DISCHARGED UNDOPED HYDROGENATED SILICON
SHIRAFUJI, J
NAGATA, S
KUWAGAKI, M
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1986, 25 (03): : 336 - 344
[7] REVERSIBLE CONDUCTIVITY CHANGES IN DISCHARGE-PRODUCED AMORPHOUS SI
STAEBLER, DL
WRONSKI, CR
[J]. APPLIED PHYSICS LETTERS, 1977, 31 (04) : 292 - 294
[8] TRAPPING PARAMETERS OF DANGLING BONDS IN HYDROGENATED AMORPHOUS-SILICON
STREET, RA
[J]. APPLIED PHYSICS LETTERS, 1982, 41 (11) : 1060 - 1062
[9] LIGHT-INDUCED METASTABLE DEFECTS IN HYDROGENATED AMORPHOUS-SILICON - A SYSTEMATIC STUDY
STUTZMANN, M
JACKSON, WB
TSAI, CC
[J]. PHYSICAL REVIEW B, 1985, 32 (01): : 23 - 47
[10] PREPARATION OF A-SI-H FILMS RESISTIVE TO THE STAEBLER-WRONSKI EFFECT
YAMAZAKI, M
OHAGI, H
NAKATA, J
IMAO, S
SHIRAFUJI, J
FUJIBAYASHI, K
INUISHI, Y
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (09): : L1739 - L1741

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