THE ROOM-TEMPERATURE OXIDATION OF CU/SI(100) AND CU/SI(111) INTERFACES STUDIED BY AUGER-ELECTRON SPECTROSCOPY, ELECTRON ENERGY-LOSS SPECTROSCOPY, AND HIGH-RESOLUTION ELECTRON ENERGY-LOSS SPECTROSCOPY

被引:24
作者
MOLLER, PJ
HE, JW
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期
关键词
D O I
10.1116/1.574309
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:996 / 1002
页数:7
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