CRITERION ANALYSIS ON NONPOISONING OF THE TARGET SURFACE

被引：4

作者：

WANG, JY ^{[1
]}

CHEN, W ^{[1
]}

WANG, Y ^{[1
]}

ZHAO, N ^{[1
]}

HE, XM ^{[1
]}

RODIONOV, YA ^{[1
]}

机构：

[1] MINSK RADIOENGN INST, MINSK, BELARUS

来源：

JOURNAL OF APPLIED PHYSICS | 1993年 / 73卷 / 05期

关键词：

D O I：

10.1063/1.353083

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The mechanism of target poisoning in reactive sputtering is analyzed. The methods used to reduce the target poisoning are discussed. According to the transport mechanism of the particles of reactive gas in a chamber, a criterion for nonpoisoning of the target is given and two mathematical expressions are respectively derived for ''absolute nonpoisoning'' and ''experimental nonpoisoning.''

引用

页码：2518 / 2523

页数：6

共 3 条

[1] PREDICTING THIN-FILM STOICHIOMETRY IN REACTIVE SPUTTERING [J].